ITTC Project

Plasma Research Laboratory

Project Award Date: 0000-00-00


The Plasma Research Laboratory (PRL) is developing new reactive ion etching (RIE) processes for semiconductor device improvement. We have recently developed a through-the-wafer slot via hole etch process for GaAs based HEMTs and MMICs. The use of small RIE slot vias to connect to each individual source contact has been shown to result in an increased packing density (smaller chip area), lower source inductance (eliminates the need for source airbridges), more uniform heat distribution, and increased gain and efficiency. Via holes are etched from the back of the thinned wafer to the front of the devices, then metalized to provide ground for source contacts. These slot vias require very high aspect ratios; vias are typically on the order of 20 x 60 m2 or smaller on a 50-micron-thick substrate. An optimum via hole etching process using a Plasma Therm 790 RIE system was determined to be 300V bias voltage, gas flow ratio of Cl2:BCl3:Ar $&$ 4:3:10, and chamber pressure of 15 mTorr. The average etch time for 20 m wide x 60 m long vias on a 50-micron-thick, three-inch-diameter wafer is 180 minutes using a total flow rate of 50 sccm, which corresponds to an average etch rate of 0.3 m/min. This process has been succesfully implemented on K and Ka band HEMT power amplifiers fabricated by TRW.


Project Sponsors

Primary Sponsor(s): National Science Foundation, Kansas Technology Enterprise Corporation, TRW, TriQuint, The University of Kansas

Partner with ITTC

The Information and Telecommunication Technology Center at the University of Kansas has developed several assistance policies that enhance interactions between the Center and local, Kansas, or national companies. 

ITTC assistance includes initial free consulting (normally one to five hours). If additional support is needed, ITTC will offer one of the following approaches: 

Sponsored Research Agreement

Individuals and organizations can enter into agreements with KUCR/ITTC and provide funds for sponsored research to be performed at ITTC with the assistance of faculty, staff and students.

Licensing and Royalty/Equity Agreement

An ITTC goal is the development of investment-grade technologies for transfer to, and marketing by, local, Kansas, and national businesses. To enhance this process, the Center has developed flexible policies that allow for licensing, royalty, and equity arrangements to meet both the needs of ITTC and the company.

Commercialization Development

Companies with a technology need that can be satisfied with ITTC's resources can look to us for assistance. We can develop a relationship with interested partners that will provide for the development of a technology suited for commercialization.

ITTC Resource Access

ITTC resources, including computers and software systems, may be made available to Kansas companies in accordance with the Center's mission and applicable Regents and University policies.

ITTC Calendar
There are no upcoming events at this time.